Liquid silicide formation on the Si wafer free surface during Ni diffusion at 1200°C

Journal of Applied Physics

Volumn 71, Issue 1, 1992, Pages 196-203

  Li, Jianxing ^a   Yang, Woun Suck ^a   Tan, Teh Y ^a   Chevacharoenkul, Sopa ^b   Chapman, Richard ^b  

^a DUKE UNIVERSITY   (United States)

^b MCNC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 36449005403     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.350736     Document Type: Article

References (12)