High resolution Fowler-Nordheim field emission maps of thin silicon oxide layers

Applied Physics Letters

Volumn , Issue , 1995, Pages 93-

  Ruskell, Todd G ^a   Workman, Richard K ^a   Chen, Dong ^a   Sarid, Dror ^a   Dahl, Sarah ^a   Gilbert, Stephen ^a  

^a UNIVERSITY OF ARIZONA   (United States)

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EID: 36449005134     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.116782     Document Type: Article

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