Ultrahigh resolution of calixarene negative resist in electron beam lithography

Applied Physics Letters

Volumn , Issue , 1995, Pages 1297-

  Fujita, J ^a   Ohnishi, Y ^a   Ochiai, Y ^a   Matsui, S ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 36449004970     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.115958     Document Type: Article

References (0)