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Applied Physics Letters
Volumn , Issue , 1995, Pages 1492-
N depth profiles in thin SiO2 grown or processed in N2O: The role of atomic oxygen
(3)
Carr, E C
a
Ellis, K A
a
Buhrman, R A
a
a
Department of Molecular Biology and Genetics
(
United States
)
Author keywords
[No Author keywords available]
Indexed keywords
EID
:
36449004152
PISSN
:
00036951
EISSN
:
None
Source Type
:
Journal
DOI
:
10.1063/1.113665
Document Type
:
Article
Times cited : (
106
)
References (
16
)
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.
