Observation of inverse reactive ion etching lag for silicon dioxide etching in inductively coupled plasmas

Applied Physics Letters

Volumn , Issue , 1995, Pages 10-

  Doemling, M F ^a   Rueger, N R ^a   Oehrlein, G S ^a  

^a STATE UNIVERSITY OF NEW YORK   (United States)

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EID: 36449003502     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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