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Journal of Applied Physics

Volumn 70, Issue 2, 1991, Pages 693-707

Metal-dopant-compound formation in TiSi2 and TaSi2: Impact on dopant diffusion and contact resistance

(7) Probst, V a Schaber, H a Mitwalsky, A a Kabza, H a Hoffmann, B a Maex, K b Van Den Hove, L b

a SIEMENS AG (Germany)

b IMEC (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 36449003446 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.349625 Document Type: Article

Times cited : (46)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.