Deposition of high-quality TiN using tetra-isopropoxide titanium in an electron cyclotron resonance plasma process

Applied Physics Letters

Volumn 67, Issue , 1995, Pages 2934-

  Weber, A ^a   Poeckelmann, R ^a   Klages, C P ^a  

^a FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST   (Germany)

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Indexed keywords

EID: 36449002571     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.114847     Document Type: Article

References (8)