Crystallization-induced stress in silicon thin films

Applied Physics Letters

Volumn 60, Issue 22, 1992, Pages 2746-2748

  Miura, Hideo ^a   Ohta, Hiroyuki ^a   Okamoto, Noriaki ^a   Kaga, Toru ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 36449002236     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.106864     Document Type: Article

References (9)