Low interface trap density for remote plasma deposited SiO2 on n-type GaN

Applied Physics Letters

Volumn , Issue , 1995, Pages 1850-

  Casey Jr , H C ^a   Fountain, G G ^b   Alley, R G ^b   Keller, B P ^c   DenBaars, Steven P ^c  

^a DUKE UNIVERSITY   (United States)

^b RTI INTERNATIONAL   (United States)

^c UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 36449002142     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (0)