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Volumn , Issue , 1995, Pages 316-
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Pulse-time-modulated electron cyclotron resonance plasma etching with low radio-frequency substrate bias
a
a
NEC CORPORATION
(Japan)
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Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 36449002095
PISSN: 00036951
EISSN: None
Source Type: Journal
DOI: 10.1063/1.116071 Document Type: Article |
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Times cited : (4)
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References (0)
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