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Volumn 78, Issue 9, 1995, Pages 5395-5403

High-flux low-energy (≅20 eV) N+2 ion irradiation during TiN deposition by reactive magnetron sputtering: Effects on microstructure and preferred orientation

(5) Hultman, L a Sundgren, J E a Greene, J E a Bergstrom, D B b Petrov, I b

a LINKÖPING UNIVERSITY (Sweden)

b UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 36449001627 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.359720 Document Type: Article

Times cited : (235)

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