Simultaneous shallow-junction formation and gate doping p-channel metal-semiconductor-oxide field-effect transistor process using cobalt silicide as a diffusion/doping source

Applied Physics Letters

Volumn 64, Issue 3, 1994, Pages 345-347

  Chen, Wei Ming ^a   Lin, Jengping ^a   Banerjee, Sanjay K ^a   Lee, Jack C ^a  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

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EID: 36449001189     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.111143     Document Type: Article

References (8)