Carbon incorporation in silicon for suppressing interstitial-enhanced boron diffusion

Applied Physics Letters

Volumn , Issue , 1995, Pages 1370-

  Stolk, P A ^a   Eaglesham, D J ^a   Gossmann, H J ^a   Poate, J M ^a  

^a LUCENT TECHNOLOGIES   (United States)

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EID: 36449001067     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.113204     Document Type: Article

References (16)