The 100-kV gas and metal ion source for high current ion implantation

Review of Scientific Instruments

Volumn 63, Issue 4, 1992, Pages 2422-2424

  Bugaev, S P ^a   Nikolaev, A G ^a   Oks, E M ^a   Schanin, P M ^a   Yushkov, G Yu ^a  

^a INSTITUTE OF HIGH CURRENT ELECTRONICS   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 36449000464     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1143827     Document Type: Article

References (10)