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Journal of Applied Physics

Volumn 74, Issue 11, 1993, Pages 6538-6553

Plasma chemistry of He/O2/SiH4 and He/N 2O/SiH4 mixtures for remote plasma-activated chemical-vapor deposition of silicon dioxide

(1) Kushner, Mark J a

a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 36448999454 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.355115 Document Type: Article

Times cited : (99)

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