Influence of precursor gases on the structure of plasma deposited amorphous hydrogenated carbon-nitrogen films

Applied Physics Letters

Volumn , Issue , 1995, Pages 2645-

  Franceschini, D F ^a   Freire Jr , F L ^a   Silva, S R P ^b  

^a PONTIFICAL CATHOLIC UNIVERSITY OF RIO DE JANEIRO   (Brazil)

^b UNIVERSITY OF CAMBRIDGE   (United Kingdom)

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EID: 36448999243     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.116268     Document Type: Article

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