Selfconsistent simulation of sputter deposition with the Monte Carlo method

Journal of Applied Physics

Volumn 75, Issue 4, 1994, Pages 2278-2285

  Kersch, A ^a   Morokoff, W ^b   Werner, Chr ^a  

^a SIEMENS AG   (Germany)

^b UNIVERSITY OF MINNESOTA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 36448998938     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.356292     Document Type: Article

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