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Journal of Applied Physics

Volumn 75, Issue 12, 1994, Pages 7718-7727

A combined plasma-surface model for the deposition of C:H films from a methane plasma

(2) Von Keudell, A a Moller W a

a MAX PLANCK INSTITUT FÜR PLASMAPHYSIK (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 36448998904 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.356603 Document Type: Article

Times cited : (109)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.