Structural characterization by electronic transport properties on Fe 3Si films

Journal of Physics D: Applied Physics

Volumn 40, Issue 22, 2007, Pages 6873-6878

  Kobayashi, Y ^a   Kaneko, T ^a   Kamogawa, M ^a   Asai, K ^a   Akiyama, K ^b   Funakubo, H ^c  

^a UNIVERSITY OF ELECTRO COMMUNICATIONS   (Japan)

^b KANAGAWA ACADEMY OF SCIENCE AND TECHNOLOGY   (Japan)

^c TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON TRANSPORT PROPERTIES; ELECTRONIC STRUCTURE; HALL EFFECT; MAGNETORESISTANCE; POLYCRYSTALLINE MATERIALS; SCANNING ELECTRON MICROSCOPY;

ELECTRICAL TRANSPORT MEASUREMENTS; FERROMAGNETIC-TUNNELLING CONDUCTION; ORIENTED EPITAXIAL FILMS; STRUCTURAL CHARACTERIZATION;

EPITAXIAL FILMS;

EID: 36448982153     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/40/22/003     Document Type: Article

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