Etching of oxide films of semicondicting materials in an atomic hydrogen flow

Russian Microelectronics

Volumn 27, Issue 2, 1998, Pages 91-95

  Kagadei, V A ^a   Proskurovskii, D I ^a   Romas', L M ^a  

^a INSTITUTE OF HIGH CURRENT ELECTRONICS   (Russian Federation)

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[No Author keywords available]

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EID: 3643141176     PISSN: 10637397     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (15)

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