Precision improvement in optical proximity correction by optimizing second illumination source shape

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 12 SUPPL. B, 1996, Pages 6395-6399

  Nakae, Akihiro ^a   Kamon, Kazuya ^a   Hanawa, Tetsuro ^a   Moriizumi, Koichi ^a   Nakao, Shuji ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

Image profile simulation; Modified illumination; Optical proximity correction; Optical proximity effect; Photolithography

Indexed keywords

EID: 3643078179     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.6395     Document Type: Article

References (6)

1. M. D. Levenson, N. S. Viswanathan and R. A. Simpson: IEEE Trans. Electron Devices 29 (1982) 1828.
2. K. Kamon, T. Miyamoto, Y. Myoi, H. Nagata, M. Tanaka and K. Horie: Jpn. J. Appl. Phys. 30 (1991) 3021.
3. O. W. Otto, J. G. Garofalo, K. K. Low, C. M. Yuan, R. C. Henderson, C. Pierrat, R. L. Kostelak, S. Vaidya and P. K. Vasudev: SPIE Proc. 2197 (1994) 278.
4. S. Mimotogi and S. Inoue: Dig. Pap. Microlithography 95 35 (1995).
5. T. Hanawa, K. Kamon, A. Nakae, S. Nakao and K. Moriizumi: SPIE Proc. 2726 (1996) 640.
6. K. Kamon, W. Wakamiya, H. Nagata, K. Moriizumi, T. Miyamoto, Y. Myoi and M. Tanaka: SPIE Proc. 2512 (1995) 491.