|
Volumn 20, Issue 11, 2007, Pages 857-863
|
Rational design of a new class of diffusion-inhibited HABI with fast back-reaction
|
Author keywords
Diffusion inhibited; Fast back reaction; First order kinetics; Hexaarylbiimidazole (HABI); Photochromism; Photoresponsive material; Radical cleavage; Triplet radical pair
|
Indexed keywords
CRYSTAL STRUCTURE;
DIFFUSION;
PARAMAGNETIC RESONANCE;
PHOTOCHEMICAL REACTIONS;
PHOTOCHROMISM;
DIFFUSION INHIBITED;
FAST BACK REACTIONS;
FIRST ORDER KINETICS;
NAPHTHALENE LINKERS;
PHOTOCHROMIC MOLECULES;
PHOTORESPONSIVE MATERIALS;
RADICAL CLEAVAGE;
THERMAL CONVERSION;
TRIPHENYLIMIDAZOLYL RADICALS;
TRIPLET RADICAL PAIRS;
NAPHTHALENE;
|
EID: 36349012503
PISSN: 08943230
EISSN: 10991395
Source Type: Journal
DOI: 10.1002/poc.1183 Document Type: Conference Paper |
Times cited : (50)
|
References (40)
|