Improvement of CD variation control for attenuated phase-shift mask

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6607, Issue PART 1, 2007, Pages

  Takagi, Mikio ^a   Mizoguchi, Takashi ^a   Kojima, Yosuke ^a   Saga, Tadashi ^a   Haraguchi, Takashi ^a   Fukushima, Yuichi ^a   Tanaka, Tsuyoshi ^a   Okuda, Yoshimitsu ^a   Inazuki, Yukio ^b   Yoshikawa, Hiroki ^b   Okazaki, Satoshi ^b  

^a TOPPAN PRINTING CO LTD   (Japan)

^b SHIN ETSU CHEMICAL CO LTD   (Japan)

Author keywords

45nm node; Attenuated phase shift mask; CD variation control; Immersion lithography; Resolution enhancement technologies

Indexed keywords

CHROMIUM; DRY ETCHING; FILM THICKNESS; PHASE SHIFT; PRINTED CIRCUITS;

ATTENUATED PHASE SHIFT MASK; CD VARIATION CONTROL; RESOLUTION ENHANCEMENT TECHNOLOGIES; SHADING LAYER; SHADING LAYERS; WAFER PRINTING;

MASKS;

EID: 36248999921     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.728924     Document Type: Conference Paper

References (0)