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Volumn 68, Issue 12, 2007, Pages 2227-2232

Structural and optical evaluation of WOxNy films deposited by reactive magnetron sputtering

Author keywords

A. Thin films; B. Plasma deposition; C. X ray diffraction; D. Optical properties

Indexed keywords

ENERGY DISPERSIVE X RAY ANALYSIS; LIGHT ABSORPTION; MAGNETRON SPUTTERING; OPTICAL BAND GAPS; PARTIAL PRESSURE; PLASMA DEPOSITION; REFRACTIVE INDEX; TUNGSTEN COMPOUNDS; X RAY DIFFRACTION;

EID: 36248947219     PISSN: 00223697     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jpcs.2007.06.005     Document Type: Article
Times cited : (8)

References (15)
  • 7
    • 36248940190 scopus 로고    scopus 로고
    • S. Yang, A.K. Vishnu, US Patent 7002202, 2006.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.