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Volumn 68, Issue 12, 2007, Pages 2227-2232
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Structural and optical evaluation of WOxNy films deposited by reactive magnetron sputtering
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Author keywords
A. Thin films; B. Plasma deposition; C. X ray diffraction; D. Optical properties
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Indexed keywords
ENERGY DISPERSIVE X RAY ANALYSIS;
LIGHT ABSORPTION;
MAGNETRON SPUTTERING;
OPTICAL BAND GAPS;
PARTIAL PRESSURE;
PLASMA DEPOSITION;
REFRACTIVE INDEX;
TUNGSTEN COMPOUNDS;
X RAY DIFFRACTION;
COORDINATION NUMBERS;
REACTIVE GAS PARTIAL PRESSURES RATIOS;
SWANEPOEL'S METHODS;
TUNGSTEN OXYNITRIDES;
THIN FILMS;
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EID: 36248947219
PISSN: 00223697
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jpcs.2007.06.005 Document Type: Article |
Times cited : (8)
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References (15)
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