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Volumn 358, Issue 1, 2007, Pages 503-512
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Application of the NEPSAC nonlinear predictive control strategy to a semiconductor reactor
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
CONTROL EQUIPMENT;
DEPOSITION;
FLEXIBLE ELECTRONICS;
HEATING;
MIMO SYSTEMS;
MODEL PREDICTIVE CONTROL;
MULTIPLEXING EQUIPMENT;
NONLINEAR SYSTEMS;
PREDICTIVE CONTROL SYSTEMS;
RAPID THERMAL PROCESSING;
VAPOR DEPOSITION;
HIGH-TEMPERATURE PROCESSING;
INTEGRATED CIRCUIT FABRICATION;
MULTI INPUT MULTI OUTPUT SYSTEMS;
NONLINEAR PREDICTIVE CONTROL;
RAPID THERMAL CHEMICAL VAPOR DEPOSITIONS;
SINGLE WAFER PROCESSING;
TECHNICAL DIFFICULTIES;
TEMPERATURE UNIFORMITY;
SILICON WAFERS;
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EID: 36148998064
PISSN: 01708643
EISSN: None
Source Type: Book Series
DOI: 10.1007/978-3-540-72699-9_42 Document Type: Article |
Times cited : (13)
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References (7)
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