Flow and batch systems for copper(II) potentiometric sensing

Talanta

Volumn 74, Issue 2, 2007, Pages 190-197

  Gismera, Ma Jesús ^a   Sevilla, Ma Teresa ^a   Procopio, Jesús R ^a  

^a UNIVERSIDAD AUTÓNOMA DE MADRID   (Spain)

Author keywords

Chemically modified carbon paste electrode; Copper potentiometric sensor; Flow injection potentiometry; Tetramethyl thiuram disulfide

Indexed keywords

COPPER COMPOUNDS; ELECTRODES; METAL IONS; PH EFFECTS;

CHEMICALLY MODIFIED CARBON PASTE ELECTRODE; COPPER POTENTIOMETRIC SENSOR; FLOW ANALYSIS; FLOW INJECTION POTENTIOMETRY; SELECTIVITY COEFFICIENTS; TETRAMETHYL THIURAM DISULFIDE;

POTENTIOMETRIC SENSORS;

EID: 36049012739     PISSN: 00399140     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.talanta.2007.05.052     Document Type: Article

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