Design of a mesh microreactor for even flow distribution and narrow residence time distribution

Chemical Engineering Journal

Volumn 135, Issue SUPPL. 1, 2008, Pages

  Amador, C ^a   Wenn, D ^b   Shaw, J ^b   Gavriilidis, A ^a   Angeli, P ^a  

^a UNIVERSITY COLLEGE LONDON   (United Kingdom)

^b CRL   (United Kingdom)

Author keywords

Microreactor; Residence time distribution; Resistance network model

Indexed keywords

COMPUTATIONAL FLUID DYNAMICS; COMPUTER SIMULATION; ELECTRIC RESISTANCE; VISCOSITY;

MICROREACTOR; RESIDENCE TIME DISTRIBUTION; RESISTANCE NETWORK MODEL;

CHEMICAL REACTORS;

CHEMICAL REACTORS; COMPUTATIONAL FLUID DYNAMICS; COMPUTER SIMULATION; ELECTRIC RESISTANCE; VISCOSITY;

EID: 36048983418     PISSN: 13858947     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cej.2007.07.021     Document Type: Article

References (11)

1. C. Turner, J. Shaw, B. Miller, V. Bains, Solvent extraction using micro-mesh reactors, IMRET 4, Poster Session 1, Atlanta, 2000.
2. Amador C., Angeli P., Gavriilidis A., Shaw J., and Wenn D. Analysis of mass transfer and chemical reaction in a mesh microreactor. Proceedings of the First International Symposium on Process Intensification and Miniaturisation (PIM-1). Newcastle, UK, August 18-21 (2003)
3. Amador C., Angeli P., and Gavriilidis A. Flow distribution in microreactor scale-out geometries and the effect of manufacturing tolerances and channel blocking. Chem. Eng. J. 101 (2004) 379-390
4. Levenspiel O. Chemical Reaction Engineering (1972), Wiley, New York (Chapter 9)
5. Fogler H.S. Elements of Chemical Reaction Engineering. 4th ed. (2005), Prentice-Hall
6. Wenn D.A., Shaw J.E.A., and Mackenzie B. A mesh microreactor for two-phase reactions. Lab Chip 3 (2003) 180-186
7. Bird R.B., Stewart W.E., and Lightfoot E.N. Transport Phenomena (2002), Wiley
8. Papanastasiou T.C., Georgiou G.C., and Alexandrou A.N. Viscous Fluid Flow (2000), CRC Press
9. FEMLAB Reference Manual, 2002.
10. K.E. Johnson, private communication, 2004.
11. R. Zitny, private communication, 2004.