Photochemical selective deposition of nickel using a TiO2-Pd2+ layer

Journal of Photochemistry and Photobiology A: Chemistry

Volumn 193, Issue 1, 2008, Pages 56-64

  Byk, T V ^a   Sokolov, V G ^b   Gaevskaya, T V ^b   Skorb, E V ^b   Sviridov, D V ^b   Noh, Chang Ho ^a   Song, Ki Yong ^a   Kwon, Young Nam ^a   Cho, Sung Hen ^a  

^a Samsung Advanced Institute of Technology (SAIT)   (South Korea)

^b BELARUSIAN STATE UNIVERSITY   (Belarus)

Author keywords

Amorphous titanium oxide; Oxalic acid; Palladium; Photochemical selective nickel deposition

Indexed keywords

EID: 36048977541     PISSN: 10106030     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jphotochem.2007.06.007     Document Type: Article

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