Study of boron-doped diamond films by microwave plasma CVD method

Key Engineering Materials

Volumn 353-358, Issue PART 3, 2007, Pages 1883-1886

  Murakami, Ri Ichi ^a   Fukui, Shinichiro ^a   Yonekura, Daisuke ^a   Yim, Cheolmun ^a  

^a UNIVERSITY OF TOKUSHIMA   (Japan)

Author keywords

Boron doped; CVD; Cyclic voltammetry; Micro nano crystalline diamond

Indexed keywords

BORON COMPOUNDS; CYCLIC VOLTAMMETRY; DOPING (ADDITIVES); PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SURFACE MORPHOLOGY;

MICRO NANO CRYSTALLINE DIAMOND; MICROCRYSTALLINE DIAMOND; VACUUM CHAMBERS;

DIAMOND FILMS;

EID: 36048967556     PISSN: 10139826     EISSN: 16629795     Source Type: Book Series    
DOI: 10.4028/0-87849-456-1.1883     Document Type: Conference Paper

References (6)

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4. E.C. Almeida, A.V. Diniz, J.M. Rosolen, V.J. Trava-Airoldi and N.G. Ferreira: Diamond Relat. Mater. Vol. 14 (2005) p. 679
5. Y. Yoshinaga and N. Otake: Vaper deposition diamond (Ohm publications, Japan 1995).
6. C. Levy-Clement, N.A.Nado and A.Katty: Diamond Relat. Mater. Vol.12 (2003) p. 606