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Volumn 91, Issue 1, 2007, Pages

Low-temperature method for enhancing sputter-deposited Hf O2 films with complete oxidization

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE VOLTAGE (C-V); INTERFACIAL OXIDES; PARASITIC OXIDES; PROPYL ALCOHOL;

EID: 36048938002     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2753762     Document Type: Article
Times cited : (35)

References (16)
  • 9
    • 84961742972 scopus 로고    scopus 로고
    • Proceedings of the IEEE 2002 International Interconnect Technology Conference
    • S. Ogawa, T. Nasuno, M. Egami, and A. Nakashima, Proceedings of the IEEE 2002 International Interconnect Technology Conference, 2002, p. 220.
    • (2002) , pp. 220
    • Ogawa, S.1    Nasuno, T.2    Egami, M.3    Nakashima, A.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.