Plasma-assisted catalysis total oxidation of trichloroethylene over gold nano-particles embedded in SBA-15 catalysts

Applied Catalysis B: Environmental

Volumn 76, Issue 3-4, 2007, Pages 275-281

  Magureanu, Monica ^a   Mandache, Nicolae Bogdan ^a   Hu, Juncheng ^b   Richards, Ryan ^b   Florea, Mihaela ^c   Parvulescu, Vasile I ^c  

^a NATIONAL INSTITUTE FOR LASER   (Romania)

^b JACOBS UNIVERSITY BREMEN   (Germany)

^c UNIVERSITY OF BUCHAREST   (Romania)

Author keywords

Chlorinated volatile organic compounds; Dielectric barrier discharge; Gold catalysts; Non equilibrium plasma; Trichloroethylene

Indexed keywords

ATMOSPHERIC PRESSURE; CATALYSTS; GOLD; NANOPARTICLES; OZONE; POSITIVE IONS;

CHLORINATED VOLATILE ORGANIC COMPOUNDS; DIELECTRIC BARRIER DISCHARGE; GOLD CATALYSTS; NON-EQUILIBRIUM PLASMA; ROOM TEMPERATURE;

TRICHLOROETHYLENE;

EID: 35448995563     PISSN: 09263373     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apcatb.2007.05.030     Document Type: Article

References (53)

1. Urashima K., and Chang J.-S. IEEE Trans. Diel. Electr. Insul. 7 5 (2000) 602
2. Kogelschatz U. Plasma Chem. Plasma Process 23 1 (2003) 1
3. Futamura S., Zhang A.H., and Yamamoto T. J. Electrostatics 42 (1997) 51
4. Futamura S., Zhang A.H., and Yamamoto T. IEEE Trans. Ind. Appl. 35 4 (1999) 760
5. Francke K.-P., Miessner H., and Rudolph R. Plasma Chem. Plasma Process 20 3 (2000) 393
6. Kirkpatrick M.J., Finney W.C., and Locke B.R. Plasmas Polym. 8 3 (2003) 165
7. Futamura S., and Yamamoto T. IEEE Trans. Ind. Appl 33 2 (1997) 447
8. Futamura S., Einaga H., and Zhang A. IEEE Trans. Ind. Appl. 37 4 (2001) 978
9. Hsiao M.C., Merritt B.T., Penetrante B.M., Vogtlin G.E., and Wallman P.H. J. Appl. Phys. 78 (1995) 3451
10. Vertriest R., Morent R., Dewulf J., Leys C., and Van Langenhove H. Plasma Sources Sci. Tehnol. 12 (2003) 412
11. Evans D., Rosocha L.A., Anderson G.K., Coogan J.J., and Kushner M.J. J. Appl. Phys. 74 (1993) 5378
12. Futamura S., Zhang A., Einaga H., and Kabashima H. Catal. Today 72 (2002) 259
13. Oda T., Takahashi T., and Tada K. IEEE Trans. Ind. Appl. 35 2 (1999) 373
14. Oda T., Takahashi T., and Kohzuma S. IEEE Trans. Ind. Appl. 37 4 (2001) 965
15. Oda T., Yamaji K., and Takahashi T. IEEE Trans. Ind. Appl. 40 2 (2004) 430
16. Han S.B., Oda T., and Ono R. IEEE Trans. Ind. Appl. 41 5 (2005) 1343
17. Oda T., Takahashi T., and Yamaji K. IEEE Trans. Ind. Appl. 40 5 (2004) 1249
18. Oda T. J. Electrostatics 57 (2003) 293
19. Kim H.H. Plasma Process. Polym. 1 2 (2004) 91
20. Finocchio E., Sapienza G., Baldi M., and Busca G. Appl. Catal. B: Env. 51 (2004) 143
21. Kim M.H., and Choo K.-H. Catal. Commun. 8 (2007) 462
22. Tseng T.-K., Chu H., and Hsu H.-H. Environ. Sci. Technol. 37 (2003) 171
23. Kang Y.M., and Wan B.Z. Appl. Catal. A 114 (1994) 35
24. Drago R.S., Jurczyk K., Singh D.J., and Younget V. Appl. Catal. B: Env. 6 (1995) 155
25. Watanabe N., Yamashita H., Miyadera H., and Tominaga S. Appl. Catal. B: Env. 8 (1996) 405
26. González-Velasco J.R., Aranzabal A., Gutiérrez-Ortiz J.I., López-Fonseca R., and Gutiérrez-Ortiz M.A. Appl. Catal. B: Env. 19 (1998) 189
27. Lopez-Fonseca R., Gutiérrez-Ortiz J.I., Gutiérrez-Ortiz M.A., and González-Velasco J.R. Catal. Today 107-108 (2005) 200
28. Haruta M. Catal. Today 36 (1997) 153
29. Haruta M. Stud. Surf. Sci. Catal. 110 (1997) 123
30. Enache D.I., Knight D.W., and Hutchings G.J. Catal. Lett. 103 (2005) 43
31. Guan B., Xing D., Cai G., Wan X., Yu N., Fang Z., Yang L., and Shi Z. J. Am. Chem. Soc. 127 (2005) 18004
32. Abad A., Concepcion P., Corma A., and Garcia H. Angew. Chem. Int. Ed. 44 (2005) 4066
33. Enache D.I., Ewards J.K., Landon P., Solsona-Espriu B., Carley A.F., Herzing A.A., Watanabe M., Kiely C.J., Knight D.W., and Hutchings G.J. Science 311 (2006) 362
34. Choudhary V.R., Dhar A., Jana P., Jha R., and Uphade B.S. Green Chem. 7 (2005) 768
35. Corti C.W., Holliday R.J., and Thompson D.T. Appl. Catal. A 291 (2005) 253
36. Gu J., Lin J., You G., Xiong L., Qian S., Hua Z., and Chen H. Adv. Mater. 17 (2005) 557
37. Zhu K., Hu J., and Richards R. Catal. Lett. 100 (2005) 195
38. Yang C., Sheu H., and Chao K. Adv. Funct. Mater. 12 (2002) 143
39. Hu J., Chen L., Zhu K., Suchopar A., and Richards R. Catal. Today 122 (2007) 277
40. Nutt M.O., Heck K.N., Alvarez P., and Wong M.S. Appl. Catal. B: Environ. 69 (2006) 115
41. Nutt M.O., Hughes J.B., and Wong M.S. Environ. Sci. Technol. 39 (2005) 1346
42. Rakness K., Gordon G., Langlais B., Masschelein W., Matsumoto N., Richard Y., Robson C.M., and Somiya I. Ozone Sci. Eng. 18 (1996) 209
43. Zhao D.Y., Feng J.L., Huo Q.S., Melosh N., Fredrickson G.H., Chmelka B.F., and Stucky G.D. Science 279 (1998) 548
44. Sener C., Dogu T., and Dogu G. Micropor. Mesopor. Mater. 94 (2006) 89
45. Xu X., Li J., Hao Z., Zhao W., and Hu C. Mater. Res. Bull. 41 (2006) 406
46. Aprile C., Abad A., Garcia H., and Corma A. J. Mater. Chem. 15 (2005) 4408
47. Yang C., Liu P., Ho Y., Chiu C., and Chao K. Chem. Mater. 15 (2003) 275
48. M. Magureanu, N.B. Mandache, V.I. Parvulescu, Plasma Chem. Plasma Process (in press).
49. Krauss M., Eliasson B., Kogelschatz U., and Wokaun A. Phys. Chem. Chem. Phys. 3 (2001) 294
50. Falkenstein Z., and Coogan J.J. J. Phys. D: Appl. Phys. 30 (1997) 817
51. Abad A., Almela C., Corma A., and Garcia H. Tetrahedron 62 (2006) 6666
52. Margitfalvi J.L., Fási A., Hegedus M., Lónyi F., Gobölös S., and Bogdanchikova N. Catal. Today 72 (2002) 157
53. Concepcion P., Carrettin S., and Corma A. Appl. Catal. A: General 307 (2006) 42