Influence of processing parameters on deposition rate and crystal structure of reactively sputtered HfC

Surface Engineering

Volumn 23, Issue 3, 2007, Pages 183-186

  Mohammad, F Z ^a   Lawson, K J ^a   Nicholls, J R ^a  

^a CRANFIELD UNIVERSITY   (United Kingdom)

Author keywords

HfC; Reactive sputtering

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COATINGS; FLOW OF GASES; HAFNIUM COMPOUNDS; HIGH TEMPERATURE APPLICATIONS; MAGNETRON SPUTTERING; METHANE; OXIDATION; REACTIVE SPUTTERING;

DEPOSITION RATE; PROCESSING PARAMETERS;

CRYSTAL STRUCTURE;

EID: 35348988630     PISSN: 02670844     EISSN: None     Source Type: Journal    
DOI: 10.1179/174329406X126753     Document Type: Article

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