Photo-reflectance characterization of nanometer scale active layers in Si

AIP Conference Proceedings

Volumn 931, Issue , 2007, Pages 64-68

  Chism, Will ^a   Pham, Daniel ^b   Allgair, John ^b  

^a Xitronix Corporation   (United States)

^b SEMATECH   (United States)

Author keywords

Dopant concentrations; Photo reflectance; Strain; Ultra shallow junctions

Indexed keywords

EID: 35348901966     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.2799438     Document Type: Conference Paper

References (7)

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