|
Volumn , Issue , 2007, Pages 1714-1719
|
The influence of interconnect line patterns using flat-surface and low-dielectric-loss material under high speed signal propagation
|
Author keywords
[No Author keywords available]
|
Indexed keywords
ELECTRIC POWER UTILIZATION;
ELECTRONICS PACKAGING;
MATHEMATICAL MODELS;
MICROPROCESSOR CHIPS;
PERMITTIVITY;
SIGNAL PROCESSING;
TIME DOMAIN ANALYSIS;
HIGH SPEED SIGNAL PROPAGATION;
INTERCONNECT LINE PATTERNS;
SEMICONDUCTOR PACKAGES;
TIME DOMAIN REFLECTOMETRY (TDR);
TIME DOMAIN TRANSMISSION (TDT);
DIELECTRIC MATERIALS;
|
EID: 35348846441
PISSN: 05695503
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/ECTC.2007.374026 Document Type: Conference Paper |
Times cited : (3)
|
References (5)
|