Characterization of TiOxNy films grown by PECVD method: Structural and optical properties

Solid State Phenomena

Volumn 111, Issue , 2006, Pages 151-154

  Jung, C K ^a   Bae, I S ^a   Song, Y H ^a   Cho, S J ^a   Boo, J H ^a  

^a Institute for Basic Science   (South Korea)

Author keywords

Optical structural properties; TEM analysis; TiOxNy thin films

Indexed keywords

FLOW RATE; GAS MIXTURES; OPTICAL PROPERTIES; SUBSTRATES; TITANIUM DIOXIDE; TRANSMISSION ELECTRON MICROSCOPY;

ARGON MIXTURE GAS; GLASS SUBSTRATES; NITROGEN FLOW RATE; TITANIUM OXYNITRIDE (TIOXNY) FILMS;

THIN FILMS;

EID: 35148896911     PISSN: 10120394     EISSN: None     Source Type: Book Series    
DOI: 10.4028/3-908451-18-3.151     Document Type: Conference Paper

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