The use of functionally graded poly-SiGe layers for MEMS applications

Materials Science Forum

Volumn 492-493, Issue , 2005, Pages 255-260

  Witvrouw, A ^a   Mehta, A ^a  

^a IMEC   (Belgium)

Author keywords

Functionally graded materials; MEMS; Poly SiGe

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CMOS INTEGRATED CIRCUITS; FUNCTIONALLY GRADED MATERIALS; GYROSCOPES; MEMS; STRESSES;

HIGH QUALITY FILMS; OPTIMAL THICKNESS; SINGLE LAYER PROCESSES; STRESS COMPENSATION LAYERS; STRESS GRADIENTS; STRUCTURAL LAYERS;

POLYSILICON;

EID: 35148893031     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/0-87849-970-9.255     Document Type: Conference Paper

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