Critical issues study of nano-imprint tool for semiconductor volume production

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6517, Issue PART 1, 2007, Pages

  Ina, Hideki ^a   Kasumi, Kazuyuki ^a   Kawakami, Eigo ^a   Uda, Kouji ^a  

^a CANON INC   (Japan)

Author keywords

CoO; Imprint; Lithography; Nano imprint; NIL

Indexed keywords

SEMICONDUCTOR DEVICE MANUFACTURE; X RAYS;

DOUBLE PATTERNING (DP); SEMICONDUCTOR VOLUME PRODUCTION;

NANOIMPRINT LITHOGRAPHY;

LITHOGRAPHY; PRINTING; SEMICONDUCTOR DEVICES; X RAYS;

EID: 35148840576     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.710443     Document Type: Conference Paper

References (4)

1. http://www.euva.or.jp/technical_info/technical_list.html
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4. N. Suehira, A. Terasaki, J. Seki, S. Okushima, H. Ono and H. Ina, Proc. NNT'06, 25 (2006).