An investigation of residual stress of porous titania layer by micro-arc oxidation under different voltages

Materials Science Forum

Volumn 490-491, Issue , 2005, Pages 552-557

  Huang, Ping ^a   Xu, Kewei ^a   He, Baoping ^b   Han, Yong ^a  

^a XI'AN JIAOTONG UNIVERSITY   (China)

^b BRUKER AXS INC   (United States)

Author keywords

Micro arc oxidation; Residual stress two dimensional; Titanium; X ray diffraction

Indexed keywords

COMPRESSIVE STRESS; OXIDATION; POROUS MATERIALS; RESIDUAL STRESSES; SURFACE TREATMENT; VOLTAGE MEASUREMENT; X RAY DIFFRACTION;

DIRECT OSEOINTEGRATION; MICRO-ARC OXIDATION; POROUS TITANIA LAYER; TWO-DIMENSIONAL X-RAY DIFFRACTION;

TITANIUM COMPOUNDS;

EID: 35148836120     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/0-87849-969-5.552     Document Type: Conference Paper

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