Absorption measurements of extreme ultraviolet radiation in photoresists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6517, Issue PART 2, 2007, Pages

  Garg, Rashi ^a   Antohe, Alin ^a   Denbeaux, Gregory ^a  

^a STATE UNIVERSITY OF NEW YORK   (United States)

Author keywords

Absorbance; Absorption; Extreme ultraviolet; Photoresist

Indexed keywords

ABSORBANCE; ABSORPTION LENGTH; EUV RADIATION; TRANSPARENT MEMBRANE;

LIGHT ABSORPTION; PHOTORESISTS; THICKNESS MEASUREMENT;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 35148825994     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.712427     Document Type: Conference Paper

References (9)

1. M. Chandhok et al., Techniques for directly measuring the absorbance of photoresists at EUV wavelengths, Proc. of SPIE Vol. 5374 (2004)
2. G. D. Kubiak et al., Characterization of chemically amplified resists for soft x-ray projection lithography, J. Vac. Sci. Technol. B. 10(6), Nov/Dec 1992
3. www.energetiq.com
4. www.ird-inc.com
5. www.filmetrics.com
6. nd, SPIE Press 2004.
7. F.H.Dill et al., Characterization of positive photoresist, IEEE Transactions on Electron Devices, Vol. ED-22, no. 7, July 1975, p440-4
8. http://www.cxro.lbl.gov/optical_constants/
9. The resist used is 495 PMMA A2 Resist from Microchem. It is a 495,000 average molecular weight PMMA resist formulated in anisole solvent.