An alternative procedure for the determination of the optical band gap and thickness of amorphous carbon nitride thin films

Applied Surface Science

Volumn 254, Issue 1 SPEC. ISS., 2007, Pages 412-415

  Escobar Alarcon L ^a   Arrieta, A ^a,b   Camps, E ^a   Muhl, S ^c   Rodil, S ^c   Vigueras Santiago, E ^d  

^a INSTITUTO NACIONAL DE INVESTIGACIONES NUCLEARES   (Mexico)

^b DEPARTAMENTO DE QUÍMICA   (Mexico)

^c UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO   (Mexico)

^d UNIVERSIDAD AUTÓNOMA DEL ESTADO DE MÉXICO   (Mexico)

Author keywords

Carbon nitride; DC sputtering; Laser ablation; Optical band gap

Indexed keywords

AMORPHOUS SEMICONDUCTORS; CARBON NITRIDE; GLASS; LASER ABLATION; MAGNETRON SPUTTERING; OPTICAL BAND GAPS;

ABSORBANCE SPECTRUM; ABSORBANCE SPECTRUM FITTING (ASF); PULSED LASER ABLATION; TAUC MODEL;

THIN FILMS;

EID: 35048825707     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.07.052     Document Type: Article

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