ZnO thin films grown by plasma-assisted metal-organic vapor phase epitaxy

Proceedings of the 6th Chinese Optoelectronics Symposium, COES 2003

Volumn , Issue , 2003, Pages 292-296

  Du, Guotong ^a   Zhang, Yuantao ^a   Ma, Yan ^a   Yang, Xiaotian ^a   Zhao, Baijun ^a   Liu, Boyang ^a   Yang, Tianpeng ^a   Yang, Hongjun ^a   Liu, Dali ^a  

^a JILIN UNIVERSITY   (China)

Author keywords

Chemical vapor deposition; Epitaxial growth; MOCVD; Optical films; Plasma chemistry; Plasma x ray sources; Semiconductor films; Substrates; Transistors; Zinc oxide

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DEPOSITION; DOPING (ADDITIVES); EPITAXIAL GROWTH; METALLIC FILMS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; METALLORGANIC VAPOR PHASE EPITAXY; OPTICAL PUMPING; OPTOELECTRONIC DEVICES; ORGANIC CHEMICALS; ORGANOMETALLICS; OXIDE FILMS; SAPPHIRE; SEMICONDUCTOR DOPING; SEMICONDUCTOR GROWTH; SUBSTRATES; THIN FILMS; TRANSISTORS; VAPOR DEPOSITION; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC OXIDE;

A3. METAL ORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD); METAL-ORGANIC VAPOR PHASE EPITAXY; PLASMA CHEMISTRIES; PLASMA X-RAY SOURCES; SEMICONDUCTOR FILMS; THERMAL-ANNEALING; X-RAY DIFFRACTION SPECTRUM; ZNO THIN FILM;

OPTICAL FILMS;

EID: 34948881895     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/COS.2003.1278227     Document Type: Conference Paper

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