Laser produced plasma light source for EUVL

Microlithography World

Volumn 16, Issue 3, 2007, Pages 14-16

  Mizoguchi, Hakaru ^a  

^a GIGAPHOTON INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON DIOXIDE LASERS; CONVERSION EFFICIENCY; LIGHT SOURCES; PULSED LASER APPLICATIONS; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET RADIATION; HIGH-VOLUME MANUFACTURING;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 34748918905     PISSN: 1074407X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (4)

1. International Technology Roadmap for Semiconductors, ITRS 2006 update http://www.itrs.net/Links/2006Update/2006UpdateFinal.htm.
2. SEMATECH Steering Committee Evaluation, 2006.
3. H. Mizoguchi, "EUV Source Supplier Update, Gigaphoton," Oral presentation, 2007 EUV Source Workshop, Baltimore, MD, United States, May 6, 2007; sponsored by SEMATECH. See also related technical papers at http://www.gigaphoton.com/e/paper.html.
4. T. Suganuma et al., "Evaluation of Xe and Sn Droplets as LPP Targets," poster presentation, 2007 EUV Source Workshop, Baltimore, MD, United States, May 6, 2007; sponsored by SEMATECH.