Mechanism of isolated pore formation in anodic alumina

Nanotechnology

Volumn 18, Issue 40, 2007, Pages

  Huang, Q ^a   Lye, W K ^b   Reed, M L ^b  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

^b University of Virginia   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ANODIC OXIDATION; MASKS; NANOIMPRINT LITHOGRAPHY; THIN FILMS;

ANODIZATION POTENTIAL; EMPIRICAL MODEL; MASK APERTURE SIZE; UNPATTERNED PORE SPACING;

NANOPORES;

ALUMINUM OXIDE; SILICON DIOXIDE;

ANODIZATION; ARTICLE; CHANNEL GATING; CHEMICAL PROCEDURES; CHEMICAL REACTION; ELECTROCHEMICAL ANALYSIS; EMPIRICAL RESEARCH; FILM; PRINTING; PRIORITY JOURNAL; STEADY STATE;

ALUMINUM OXIDE; ANODIZATION; LITHOGRAPHY; THIN FILMS;

EID: 34748880562     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/18/40/405302     Document Type: Article

References (19)

1. Wernick S, Pinner R and Sheasby P G 1987 The Surface Treatment and Finishing of Aluminum and its Alloys (Teddington: Finishing Publications)
2. Thompson G E 1997 Thin Solid Films 297 192
3. Parkutik V P, Albella J M, Makushok Y E, Montero I, Martinez-Deride J M and Shershulskii V I 1990 Electrochim. Acta 35 955
4. Patermarakis G, Lenas P, Karavassilis C and Parayannis G 1991 Electrochim. Acta 36 709
5. Palibroda E 1995 Electrochim. Acta 40 1051
6. Palibroda E, Farcas T and Lupsan A 1995 Mater. Sci. Eng. B 32 1
7. Palibroda E, Lupsan A, Pruneanu S and Savos M 1995 Thin Solid Films 256 101
8. Jessensky O, Müller F and Gösele U 1998 Appl. Phys. Lett. 72 1173
9. Li A P, Müller F, Birner A, Nielsch K and Gösele U 1998 J. Appl. Phys. 84 6023
10. Chou S Y, Krauss P R and Renstrom P J 1996 J. Vac. Sci. Technol. B 14 4129
11. Huang Q, Lye W K and Reed M L 2006 Appl. Phys. Lett. 88 233112
12. Parkhutik V P and Shershulsky V I 1992 J. Phys. D: Appl. Phys. 25 1258
13. Siejka J and Ortega C 1977 J. Electrochem. Soc. 124 883
14. Arai T, Hiromasu Y and Tsuji S 1996 Mater. Res. Soc. Symp. Proc. 424 37
15. Keller F, Hunter M S and Robinson D L 1953 J. Electrochem. Soc. 100 411
16. Nielsch K, Müller F, Li A P and Gösele U 2000 Adv. Mater. 12 582
17. Masuda H, Haruki Y, Masahiro S, Hidetaka A, Nakao M and Tamamura T 1997 Appl. Phys. Lett. 71 2770
18. Masuda H and Fukuda K 1995 Science 268 1466
19. Soriaga M P, Stickney J, Bottomley L A and Kim Y G 2002 Thin Films: Preparation, Characterization, Applications (New York: Plenum)