In-situ FTIR studies of the growth of vanadium dioxide coatings on glass by atmospheric pressure chemical vapour deposition for VCl4 and H2O system

Thin Solid Films

Volumn 515, Issue 24 SPEC. ISS., 2007, Pages 8768-8770

  Vernardou, D ^a   Pemble, M E ^b   Sheel, D W ^a  

^a UNIVERSITY OF SALFORD   (United Kingdom)

^b UNIVERSITY COLLEGE CORK   (Ireland)

Author keywords

APCVD; FTIR; HCl in situ monitoring; VCl4; VO2

Indexed keywords

ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; GLASS; HYDROCHLORIC ACID; SURFACE REACTIONS; VANADIUM COMPOUNDS;

PRECOATED GLASS; REACTION CONDITIONS; VANADIUM DIOXIDE;

INORGANIC COATINGS;

EID: 34648825283     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.03.081     Document Type: Article

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