Control of parameters influencing the thermal imprint of parylene/silicon

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 9 B, 2007, Pages 6363-6369

  Youn, Sung Won ^a   Goto, Hiroshi ^a   Oyama, Shoji ^b   Takahashi, Masaharu ^a   Maeda, Ryutaro ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b Engineering Department   (Japan)

Author keywords

Imprint lithography; Micromold; Parylene C; Thermal imprint

Indexed keywords

DEFECTS; PARAMETER ESTIMATION; THERMAL EFFECTS; X RAY DIFFRACTION ANALYSIS;

IMPRINT LITHOGRAPHY; MICROMOLD; THERMAL IMPRINT;

SILICON;

EID: 34648819051     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.6363     Document Type: Article

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