Tie-lined compositions of the γ and σ phases in a ternary Re-Cr-Ni system at 1423 K

Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals

Volumn 71, Issue 8, 2007, Pages 608-614

  Saito, Shigeru ^a   Kurokawa, Kazuya ^b   Hayashi, Shigenari ^b   Takashima, Toshiyuki ^a   Narita, Toshio ^b  

^a HOKKAIDO INSTITUTE OF TECHNOLOGY   (Japan)

^b HOKKAIDO UNIVERSITY   (Japan)

Author keywords

Diffusion barrier layer; Phase diagrams; Rhenium chromium nickel; Rhenium nickel; Sigma phase

Indexed keywords

CONCENTRATION (PROCESS); DIFFUSION BARRIERS; ELECTRON PROBE MICROANALYSIS; GAMMA RAYS; PHASE DIAGRAMS; QUENCHING; RHENIUM ALLOYS; VACUUM;

DIFFUSION BARRIER LAYERS; ELECTRON PROBE MICROANALYZERS; SIGMA PHASES;

TERNARY SYSTEMS;

EID: 34648816704     PISSN: 00214876     EISSN: None     Source Type: Journal    
DOI: 10.2320/jinstmet.71.608     Document Type: Article

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