Elastic double structure of amorphous carbon pillar grown by focused-ion-beam chemical vapor deposition

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 9 B, 2007, Pages 6286-6289

  Fujita, Jun Ichi ^a,b   Okada, Satoshi ^a,b   Ueki, Ryuichi ^a,b   Ishida, Masahiko ^a,c   Kaito, Takashi ^d   Matsui, Shinji ^a,e  

^a JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^b UNIVERSITY OF TSUKUBA   (Japan)

^c NEC CORPORATION   (Japan)

^d SII NANOTECHNOLOGY INC   (Japan)

^e UNIVERSITY OF HYOGO   (Japan)

Author keywords

Amorphous carbon; EB CVD; Elasticity; FIB CVD; Gallium; Young's modulus

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELASTIC MODULI; ELASTICITY; ELECTRONS; GALLIUM;

ELASTIC DOUBLE STRUCTURE; SECONDARY ELECTRONS;

AMORPHOUS CARBON;

EID: 34648812811     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.6286     Document Type: Article

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