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Volumn , Issue , 2007, Pages 268-280

The universality of NBTI relaxation and its implications for modeling and characterization

Author keywords

[No Author keywords available]

Indexed keywords

BIAS CURRENTS; DIELECTRIC RELAXATION; SEMICONDUCTOR DEVICE MODELS; THERMODYNAMIC STABILITY;

EID: 34548804466     PISSN: 00999512     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/RELPHY.2007.369904     Document Type: Conference Paper
Times cited : (159)

References (45)
  • 1
    • 10044266222 scopus 로고    scopus 로고
    • A Comprehensive Model of PMOS NBTI Degradation
    • M.A. Alam and S, Mahapatra. "A Comprehensive Model of PMOS NBTI Degradation," Microelectr.Reliab., vol. 45, no. 1, pp. 71-81, 2005.
    • (2005) Microelectr.Reliab , vol.45 , Issue.1 , pp. 71-81
    • Alam, M.A.1    Mahapatra, S.2
  • 3
    • 10044285750 scopus 로고    scopus 로고
    • Modelling Negative Bias Temperature Instabilities in Advanced p-MOSFETs
    • M. Houssa, "Modelling Negative Bias Temperature Instabilities in Advanced p-MOSFETs," Microelectr.Reliab., vol. 45, no.:1., pp. 3-12, 2005.
    • (2005) Microelectr.Reliab , vol.45 , Issue.1 , pp. 3-12
    • Houssa, M.1
  • 4
    • 20944450469 scopus 로고    scopus 로고
    • Statistical Mechanics Based Model for Negative Bias Temperature Instability Induced Degradation
    • S. Zafar, "Statistical Mechanics Based Model for Negative Bias Temperature Instability Induced Degradation," J.Appl.Phys. vol. 97, no. 10, pp. 1-9, 2005.
    • (2005) J.Appl.Phys , vol.97 , Issue.10 , pp. 1-9
    • Zafar, S.1
  • 5
    • 28744447129 scopus 로고    scopus 로고
    • Disorder-Controlled-Kinetics Model for Negative Bias Temperature Instability and its Experimental Verification
    • B. Kaezer, V. Arkhipov, R, Degraeve, N. Collaert, O. Groeseneken, and M. Goodwin, "Disorder-Controlled-Kinetics Model for Negative Bias Temperature Instability and its Experimental Verification" in Ptoc, IRPS, 2005, pp. 381-387.
    • (2005) Ptoc, IRPS , pp. 381-387
    • Kaezer, B.1    Arkhipov, V.2    Degraeve, R.3    Collaert, N.4    Groeseneken, O.5    Goodwin, M.6
  • 8
    • 0842309776 scopus 로고    scopus 로고
    • Universal Recovery Behavior of Negative Bias Temperature Instability
    • S. Rangan, N. Mielke, and E.C.C. Yeh, "Universal Recovery Behavior of Negative Bias Temperature Instability," in Proc. IEDM, 2003, pp. 341-344.
    • (2003) Proc. IEDM , pp. 341-344
    • Rangan, S.1    Mielke, N.2    Yeh, E.C.C.3
  • 11
    • 85014896062 scopus 로고
    • Investigation of Silicon-Silicon Dioxide Interface Using MOS Structure
    • Y. Miura and Y. Matukura, "Investigation of Silicon-Silicon Dioxide Interface Using MOS Structure,"Jap.J.Appl.Phys., vol. 5, pp. 180, 1966,
    • (1966) Jap.J.Appl.Phys , vol.5 , pp. 180
    • Miura, Y.1    Matukura, Y.2
  • 12
    • 0041340533 scopus 로고    scopus 로고
    • Negative Bias Temperature Instability; Road to Cross in Deep Submieron Silicon Semiconductor Manufacturing,
    • D.K. Schroder and I.A. Babcock, "Negative Bias Temperature Instability; Road to Cross in Deep Submieron Silicon Semiconductor Manufacturing," .J.Appl.Phys., Vol. 94, no. 1, pp, 1-18, 2003.
    • (2003) J.Appl.Phys , vol.94 , Issue.1 , pp. 1-18
    • Schroder, D.K.1    Babcock, I.A.2
  • 13
    • 34548722982 scopus 로고    scopus 로고
    • Negative Bias Temperature Instability: What Do We Understand?
    • online version
    • D.K. Schroder, "Negative Bias Temperature Instability: What Do We Understand?," Microelectr.Reliab.; 2006, (online version).
    • (2006) Microelectr.Reliab
    • Schroder, D.K.1
  • 14
    • 27744503541 scopus 로고    scopus 로고
    • Direct Observation of the Structure of Defect Centers Involved .'in. the Negative Bias Temperature Instability
    • J.P. Campbell, P.M. Lenahan, A,T. Krishnan, and S. Krishnan, "Direct Observation of the Structure of Defect Centers Involved .'in. the Negative Bias Temperature Instability," Appl.Phys.Leit., vol. 87, no. 20, pp. 1-3, 2005.
    • (2005) Appl.Phys.Leit , vol.87 , Issue.20 , pp. 1-3
    • Campbell, J.P.1    Lenahan, P.M.2    Krishnan, A.T.3    Krishnan, S.4
  • 15
    • 42549097470 scopus 로고    scopus 로고
    • TCAD Modeling of Negative Bias Temperature Instability
    • Monterey, USA, Sept
    • T. Grasser, R. Entner, O. Triebl, H. Enichlmair, and R. Minixhofer, "TCAD Modeling of Negative Bias Temperature Instability," in Proc. SISPAD, Monterey, USA, Sept. 2006. pp. 330-333.
    • (2006) Proc. SISPAD , pp. 330-333
    • Grasser, T.1    Entner, R.2    Triebl, O.3    Enichlmair, H.4    Minixhofer, R.5
  • 16
    • 27744444546 scopus 로고    scopus 로고
    • T Yang, C. Shen, M.-F. Li, CH. Aug, C.X. Zhu, Y.-C. Yeo, G. Samudra, S.C. Rustagi, M.B. Yu, and D.-L. .Kwong, Fast DNBTI Components in p-MOSFET with SiON Dielectric, IEEE Electron Device Lett., 26, no. 11, pp. 826-828, 2005.
    • T Yang, C. Shen, M.-F. Li, CH. Aug, C.X. Zhu, Y.-C. Yeo, G. Samudra, S.C. Rustagi, M.B. Yu, and D.-L. .Kwong, "Fast DNBTI Components in p-MOSFET with SiON Dielectric," IEEE Electron Device Lett., vol. 26, no. 11, pp. 826-828, 2005.
  • 17
    • 34548684634 scopus 로고    scopus 로고
    • A Comprehensive Model for PMDS NBTI Degradation: Recent progress
    • online version
    • M.A. Alam, H. Kufluoglu, D. Varghese, and S. Mahapatra, "A Comprehensive Model for PMDS NBTI Degradation: Recent progress," Microelectr.Reliab., 2006, (online version).
    • (2006) Microelectr.Reliab
    • Alam, M.A.1    Kufluoglu, H.2    Varghese, D.3    Mahapatra, S.4
  • 18
    • 34250753812 scopus 로고    scopus 로고
    • Physical Modeling of Negative Bias Temperature Instabilities for Predictive Extrapolation
    • V. Huard, C.R. Parthasarathy, C. Guerin, and M. Denais, "Physical Modeling of Negative Bias Temperature Instabilities for Predictive Extrapolation," in Proc. IRPS, 2006. pp. 733-734.
    • (2006) Proc. IRPS , pp. 733-734
    • Huard, V.1    Parthasarathy, C.R.2    Guerin, C.3    Denais, M.4
  • 22
    • 28844506128 scopus 로고    scopus 로고
    • NBTI Degradation: From Physical Mechanisms to Modelling
    • V. Huard, M. Denais, and C. Parthasarathy, "NBTI Degradation: From Physical Mechanisms to Modelling." Microelectr.Reliab., vol. 46, no. 1, pp. 1-23, 2006.
    • (2006) Microelectr.Reliab , vol.46 , Issue.1 , pp. 1-23
    • Huard, V.1    Denais, M.2    Parthasarathy, C.3
  • 23
    • 34548723641 scopus 로고    scopus 로고
    • D. Varghese, D. Saha, S. Mahapatra, K. Ahmed, F. Nouri, and M. Alam, ''On the Dispersive' versus Arrhenius Temperature Activation of NBTI Time Evolution in Plasma Nitrided Gate Oxides; Measurements, Theory, and Implications, in Proc. IEDM. Dee. 2005, pp. 1-4.
    • D. Varghese, D. Saha, S. Mahapatra, K. Ahmed, F. Nouri, and M. Alam, ''On the Dispersive' versus Arrhenius Temperature Activation of NBTI Time Evolution in Plasma Nitrided Gate Oxides; Measurements, Theory, and Implications," in Proc. IEDM. Dee. 2005, pp. 1-4.
  • 24
    • 12844262199 scopus 로고    scopus 로고
    • 2 Metal-Oxide-Semiconduetor Field Effect Transistors and Its Impact oil Device Lifetime, Jap.J.Appl.Phys., 4.3, no. HB, pp. 7807-7814, 2004.
    • 2 Metal-Oxide-Semiconduetor Field Effect Transistors and Its Impact oil Device Lifetime," Jap.J.Appl.Phys., vol. 4.3, no. HB, pp. 7807-7814, 2004.
  • 26
    • 33748111476 scopus 로고    scopus 로고
    • J.P. Campbell, P.M. Lenahan, A.T. Krishnan, and S. Krishnan, Observations of NBTI-lnduced Atomic-Scale Defects, IEEE Tmns.Device and Materials Reliability, 6, no. 2, pp. .1.17-1.22, 2006.
    • J.P. Campbell, P.M. Lenahan, A.T. Krishnan, and S. Krishnan, "Observations of NBTI-lnduced Atomic-Scale Defects," IEEE Tmns.Device and Materials Reliability, vol. 6, no. 2, pp. .1.17-1.22, 2006.
  • 27
    • 34548784109 scopus 로고    scopus 로고
    • Private Communications
    • V. Huard, "Private Communications".
    • Huard, V.1
  • 29
    • 0842266651 scopus 로고    scopus 로고
    • A Critical Examination of the Mechanics of Dynamic NBTI for PMOSFETS
    • M.A. Alam. "A Critical Examination of the Mechanics of Dynamic NBTI for PMOSFETS," in Proc. IEDM, 2003, pp. 345-348.
    • (2003) Proc. IEDM , pp. 345-348
    • Alam, M.A.1
  • 30
    • 10044244638 scopus 로고    scopus 로고
    • Positive Charge Generation Due to Species of Hydrogen During NBTI Phenomenon in pMOSFETs Wife Ultra-Thin SiON Gate Dielectrics
    • S. Tsujikawa and I. Yugami, "Positive Charge Generation Due to Species of Hydrogen During NBTI Phenomenon in pMOSFETs Wife Ultra-Thin SiON Gate Dielectrics,"' Microelectr.Reliab:, vol. 45, no. 1, pp. 65-69. 2005.
    • (2005) Microelectr.Reliab , vol.45 , Issue.1 , pp. 65-69
    • Tsujikawa, S.1    Yugami, I.2
  • 31
    • 0000616215 scopus 로고
    • Stretched- Expoiiential Relaxation Arising from Dispersive Diffusion of Hydrogen in Amorphous Silicon
    • J. Kakalios, R. A. Street, and W. B. Jackson, "Stretched- Expoiiential Relaxation Arising from Dispersive Diffusion of Hydrogen in Amorphous Silicon," Physical Review Letters, vol. 59, no. 9, pp. 1037-1040, 1987.
    • (1987) Physical Review Letters , vol.59 , Issue.9 , pp. 1037-1040
    • Kakalios, J.1    Street, R.A.2    Jackson, W.B.3
  • 32
    • 0028384568 scopus 로고
    • Characterization, Modeling, and Minimization of Transient Threshold Voltage Shifts in. MOSFETs
    • T.L. Tewksbury and E-S. Lee, "Characterization, Modeling, and Minimization of Transient Threshold Voltage Shifts in. MOSFETs," IEEE J.Solid-State Circuits. vol. 29, no. 3, pp. 239-252. 1994.
    • (1994) IEEE J.Solid-State Circuits , vol.29 , Issue.3 , pp. 239-252
    • Tewksbury, T.L.1    Lee, E.-S.2
  • 33
    • 34548713856 scopus 로고    scopus 로고
    • Effects of Delay Time and AC Factors on. Negative Bias Temperature Instability of PMOSFETs
    • L-S. Li, M.-G. Chen, T. P.-C. Juan, and K. Su, "Effects of Delay Time and AC Factors on. Negative Bias Temperature Instability of PMOSFETs," in IIRW Final Rep., 2006, pp. 16-19.
    • (2006) IIRW Final Rep , pp. 16-19
    • Li, L.-S.1    Chen, M.-G.2    Juan, T.P.-C.3    Su, K.4
  • 34
    • 34548746636 scopus 로고    scopus 로고
    • On the Impact of NBTI Recovery Phenomena on Lifetime' Prediction of modern pMOSFETs
    • C. Schlünder, W. Heinrigs, W. Gustin, and H. Reisinger, "On the Impact of NBTI Recovery Phenomena on Lifetime' Prediction of modern pMOSFETs," in IIRW Final Rep., 2006, pp. 1-4.
    • (2006) IIRW Final Rep , pp. 1-4
    • Schlünder, C.1    Heinrigs, W.2    Gustin, W.3    Reisinger, H.4
  • 35
    • 34548781066 scopus 로고    scopus 로고
    • NBTI: A Simple View of a Complex Phenomena
    • Tutorial
    • M.A. Alam, "NBTI: A Simple View of a Complex Phenomena," in Proc IRPS, 2006, (Tutorial).
    • (2006) Proc IRPS
    • Alam, M.A.1
  • 36
    • 34548784666 scopus 로고    scopus 로고
    • Probing Negative Bias Temperature Instability Using a Continuum Numerical Framework: Physics to Real World Operation
    • online version
    • S., Chakravarthi, A.T. Krishnan, V. Reddy, and S. Krishnan, "Probing Negative Bias Temperature Instability Using a Continuum Numerical Framework: Physics to Real World Operation," Microelectr.Reliab., 2006, (online version).
    • (2006) Microelectr.Reliab
    • Chakravarthi, S.1    Krishnan, A.T.2    Reddy, V.3    Krishnan, S.4
  • 37
    • 1642363251 scopus 로고    scopus 로고
    • Modeling Negative Bias Temperature Instabilities, in Hole Channel Metal-Oxide-Semiconductor Field Effect Transistors with Ultrathin Gate Oxide Layers
    • M. Houssa, M. Aoulaiche, J.L. Autran, C. Parthasarathy, N. Revil, and E. Vincent, "Modeling Negative Bias Temperature Instabilities, in Hole Channel Metal-Oxide-Semiconductor Field Effect Transistors with Ultrathin Gate Oxide Layers," J.Appl.Phys., vol. 95, no. 5, pp. 2786-2791, 2004.
    • (2004) J.Appl.Phys , vol.95 , Issue.5 , pp. 2786-2791
    • Houssa, M.1    Aoulaiche, M.2    Autran, J.L.3    Parthasarathy, C.4    Revil, N.5    Vincent, E.6
  • 38
    • 34547159877 scopus 로고    scopus 로고
    • Modeling of Dispersive Transpott in the Context of Negative Bias Temperature Instability
    • T Grasser, W.- Gos, and B. Kaczer, "Modeling of Dispersive Transpott in the Context of Negative Bias Temperature Instability," in IIRW Final Rep., 2006, pp. 5-10.
    • (2006) IIRW Final Rep , pp. 5-10
    • Grasser, T.1    Gos, W.2    Kaczer, B.3
  • 39
    • 3042611436 scopus 로고    scopus 로고
    • A Comprehensive Framework for Predictive Modeling of Negative Bias Temperature Instability
    • S. Chakravarthi, AT. Krishnan, V Reddy, C.F. Machala, and S. Krishnan, "A Comprehensive Framework for Predictive Modeling of Negative Bias Temperature Instability," in Proc. IRPS, 2004, pp. 273-282.
    • (2004) Proc. IRPS , pp. 273-282
    • Chakravarthi, S.1    Krishnan, A.T.2    Reddy, V.3    Machala, C.F.4    Krishnan, S.5
  • 41
    • 17044380280 scopus 로고    scopus 로고
    • M. Houssa, M. Aoulaiche, S. De Gendt, G. Groeseneken, M.M. Heyns, and A. Stesmans, Reaction-Dispersive Proton Transport Model for Negative Bias Temperature Instabilities, Appl Phys.Lett., 86 no. 9, pp.l-3, 2005.
    • M. Houssa, M. Aoulaiche, S. De Gendt, G. Groeseneken, M.M. Heyns, and A. Stesmans, "Reaction-Dispersive Proton Transport Model for Negative Bias Temperature Instabilities," Appl Phys.Lett., vol. 86 no. 9, pp.l-3, 2005.
  • 42
    • 0000937743 scopus 로고
    • Multipie-Trapping Model of Anomalous Transit-Time Dispersion in a-Se
    • L Noolandi, "Multipie-Trapping Model of Anomalous Transit-Time Dispersion in a-Se" Phys. Rev.B, vol. 16, no. 10, pp. 4466-4473, 1977.
    • (1977) Phys. Rev.B , vol.16 , Issue.10 , pp. 4466-4473
    • Noolandi, L.1
  • 43
    • 11544321991 scopus 로고    scopus 로고
    • 2 with Molecular Hydrogen
    • 2 with Molecular Hydrogen," Appl.Phys.Lett., vol. 68, no. 15, pp. 2076-2078, 1996.
    • (1996) Appl.Phys.Lett , vol.68 , Issue.15 , pp. 2076-2078
    • Stesmans, A.1
  • 44
    • 0000019521 scopus 로고    scopus 로고
    • 2 Interface
    • 2 Interface," Phys.Rev.B. vol.:61, no. 12, pp. 8393-8403, 2000.
    • (2000) Phys.Rev.B , vol.61 , Issue.12 , pp. 8393-8403
    • Stesmans, A.1
  • 45
    • 0000178481 scopus 로고
    • Equivalence of Multiple-Trapping Model and TimeDependent: Random Walk
    • p.p
    • L Noolandi, "Equivalence of Multiple-Trapping Model and TimeDependent: Random Walk," Phys.Rev. vol. 16. no. 10, p.p. 4474-4479. 1977.
    • (1977) Phys.Rev , vol.16 , Issue.10 , pp. 4474-4479
    • Noolandi, L.1


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