Micropatterning of electrodes by microcontact printing method and application to thin film transistor devices

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 9 A, 2007, Pages 5960-5963

  Takakuwa, Atsushi ^a,b   Ikawa, Mitsuhiro ^c   Fujita, Mariko ^c   Yase, Kiyoshi ^c  

^a SEIKO EPSON CORPORATION   (Japan)

^b JAPAN CHEMICAL INNOVATION INSTITUTE   (Japan)

^c NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Microcontact printing; Patterning; Poly(dimethylsiloxane); Poly(ethylenedioxythiophene); Surface treatment

Indexed keywords

CONDUCTING POLYMERS; ELECTRODES; FREE ENERGY; POLYDIMETHYLSILOXANE; SURFACE TREATMENT; ULTRAVIOLET RADIATION; VACUUM;

ELECTRODE MICROPATTERNING; MICROCONTACT PRINTING;

THIN FILM TRANSISTORS;

EID: 34548714744     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.5960     Document Type: Article

References (11)

1. A. Kumar and G. M. Whitesides: Appl. Phys. Lett. 63 (1993) 2002.
2. S. Y. Chou, P. R. Krauss, and R. J. Renstorm: Appl. Phys. Lett. 67 (1995) 3114.
3. M. Doring: Philips Tech. Rev. 40 (1982) 192.
4. H. Moilanen, J. Lappalainen, and S. Leppävuori: Sens. Actuators A. 43 (1994) 357.
5. N. L. Jeon and R. G. Nuzzo: Langmuir 11 (1995) 3024.
6. P. C. Hidber, W. Helbig, E. Kim, and G. M. Whitesides: Langmuir 12 (1996) 1375.
7. D. A. Pardo, G. E. Jabbour, and N. Peyghambarian: Adv. Mater. 12 (2000) 1249.
8. H. Sirringhaus, T. Kawase, R. H. Friend, T. Shimoda, M. Inbasekaran, W. Wu, and E. P. Woo: Science 290 (2000) 2123.
9. P. Cosseddu and A. Bonfiglio: Appl. Phys. Lett. 88 (2006) 23506.
10. D. Li and L. J. Guo: Appl. Phys. Lett. 88 (2006) 63513.
11. P. V. Necliudov, M. S. Shur, D. J. Gundlach, and T. N. Jackson: Solid-State Electron. 47 (2003) 259.