Influence of two different adatom mobilities on the initial heteroepitaxial growth kinetics

Surface Science

Volumn 601, Issue 18, 2007, Pages 4465-4469

  Trofimov, Vladimir I ^a   Kim, Jongil ^b   Bae, Seongi ^c  

^a INSTITUTE OF RADIO ENGINEERING AND ELECTRONICS   (Russian Federation)

^b CN Regional Innovation Agency   (South Korea)

^c SolarLight Ltd   (South Korea)

Author keywords

Ehrlich Schwoebel barrier; Growth mechanism; MBE; Model; Surface diffusion

Indexed keywords

DEPOSITION RATES; MASS TRANSFER; MATHEMATICAL MODELS; MOLECULAR BEAM EPITAXY; SURFACE DIFFUSION; SURFACE MORPHOLOGY;

ADATOM MOBILITIES; EHRLICH-SCHWOEBEL BARRIERS; HETERODIFFUSION COEFFICIENTS; HETEROEPITAXIAL GROWTH KINETICS;

ADATOMS;

EID: 34548612822     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2007.04.143     Document Type: Article

References (5)

1. Rosenfeld G., Poelsema B., and Comsa G. J. Cryst. Growth 151 (1995) 230
2. Trofimov V.I., and Mokerov V.G. Mater. Sci. Eng. B 89 (2002) 420
3. V.I. Trofimov, V.A. Osadchenko, Growth and Morphology of Thin Films Energoatompubl., Moscow, 1993.
4. Tersoff J., Denier van der Gon A.W., and Tromp R.M. Phys. Rev. Lett. 72 (1994) 266
5. Venables J.A., Spiller G.D.T., and Hanbuken M. Rep. Prog. Phys. 47 (1984) 399